发明名称 |
SUSCEPTOR FOR CHEMICAL VAPOR DEPOSITION, CHEMICAL VAPOR DEPOSITION APPARATUS, AND HEATING METHOD USING THE CHEMICAL VAPOR DEPOSITION APPARATUS |
摘要 |
PURPOSE: A susceptor for chemical vapor deposition, a chemical vapor deposition apparatus, and a heating method using the chemical vapor deposition apparatus are provided to grow good quality semiconductor on a substrate by uniformly heating a substrate even if the substrate is bent. CONSTITUTION: A susceptor(100) includes a susceptor body part(104) and a light absorption part(107). The susceptor body part is made of a light transmitting material. The light absorption part is formed on an upper side of the susceptor body part. A first light absorption layer(102) is formed on a lower side of a substrate(101). The first light absorption layer absorbs light passing through the susceptor body part.
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申请公布号 |
KR20120071695(A) |
申请公布日期 |
2012.07.03 |
申请号 |
KR20100133341 |
申请日期 |
2010.12.23 |
申请人 |
SAMSUNG LED CO., LTD. |
发明人 |
RHEE, DO YOUNG;LIM, JIN YOUNG;HAN, SANG HEON;KIM, KI SUNG;KIM, YOUNG SUN;KIM, SUNG TAE |
分类号 |
H01L21/205;H01L21/683 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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