发明名称 LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND RECORDING MEDIUM
摘要 PURPOSE: A liquid processing method, a liquid processing apparatus, and a recording medium are provided to prevent a convex part from being collapsed by preventing a part on which a rinse liquid is dried and a part on which rinse liquid is wet from being mixed on a surface of a processed substrate. CONSTITUTION: A processed substrate(W) is supported by a supporting part of a substrate supporting device(50). A chemical solution supply device(20) supplies a chemical solution to the processed substrate supported by the substrate supporting device. The chemical solution supply device includes a chemical solution supply part(21), a chemical solution supply tube(22), and a chemical solution nozzle(23). The chemical solution nozzle discharges the chemical solution from the chemical solution supply tube to the processed substrate. A rinse liquid supply device(25) supplies a rinse liquid to the processed substrate. A substitution accelerating liquid supply device(30) supplies a substitution accelerating liquid to the processed substrate.
申请公布号 KR20120071310(A) 申请公布日期 2012.07.02
申请号 KR20110104043 申请日期 2011.10.12
申请人 TOKYO ELECTRON LIMITED 发明人 MIZUTANI NOBUTAKA;OMORI TSUTAE;ORII TAKEHIKO;FUJITA AKIRA
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
主权项
地址