发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR SPACER, SPACER MANUFACTURED BY THE COMPOSITION AND DISPLAY DEVICE INCLUDING THE SPACER
摘要 PURPOSE: A photosensitive resin composition for forming a spacer, the spacer formed by the composition, and a display device including the spacer are provided to secure sufficient elastic recovery rate compared to existing spacers. CONSTITUTION: A photosensitive resin composition for forming a spacer includes binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. The binder resin includes first resin containing an unsaturated group which is obtained by reacting a compound with an unsaturated bond an epoxy group in one molecule with copolymer of a compound represented by chemical formula 1 and carboxylic acid with an unsaturated group and a carboxylic group. In chemical formula 1, R1 respectively a hydrogen atom, a C1 to C12 alkyl group, an allyl group, a phenyl group, a benzyl group, a halogen atom, or C1 to C8 alkoxy group; and R2 is a hydrogen atom, a hydroxyl group, a C1 to C12 alkyl group, or C1 to C8 alkoxy group.
申请公布号 KR20120069810(A) 申请公布日期 2012.06.29
申请号 KR20100131115 申请日期 2010.12.21
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HWA SEOP;KIM, SUNG SOO
分类号 G03F7/027;G02F1/13 主分类号 G03F7/027
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