| 摘要 |
<p>PURPOSE: An apparatus for heat-treating a substrate is provided to prevent the increase of inner pressure in a chamber and a main body of a heating furnace by providing gas through a diffuser consisting of a porous material. CONSTITUTION: A main body(400) of a heating furnace blocks heat not to be emitted to the outside while forming a space inside thereof and receiving a substrate placing part, a chamber, and a heating part. A first gas supply pipeline(220) is connected to the inner space of the chamber. A first exhaust pipe(230) is formed on either the chamber or a flange and discharging inner heat. A second gas supply pipeline is connected to the inner space of the main body of the heating furnace. A second exhaust pipe(420) discharges inner heat while being formed on either a side or an upper side of the main body.</p> |
