| 摘要 |
PURPOSE: An apparatus for heat-treating a substrate is provided to improve a quality by rapidly and uniformly heating a chamber in which the substrate is accepted. CONSTITUTION: A main body(400) of a heating furnace blocks inner heat not to be discharged to the outside while receiving a substrate placing part, a chamber, and a heating part. A heating part(300) is divided into a side irradiation type heating lamp and an upper irradiation type heating lamp. The side irradiation type heating lamp surrounds the circumference of the chamber. The upper irradiation type heating lamp is located on the upper portion of the chamber. The side irradiation type heating lamp and the upper irradiation type heating lamp simultaneously run and rapidly increase temperature of the entire portion of the chamber.
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