发明名称 |
FABRICATION METHOD OF STAMP COMPRISING MICRO/NANO HYBRID PATTERN |
摘要 |
<p>PURPOSE: A method for manufacturing a stamp with a micro/nano hybrid pattern is provided to prevent the deformation and the damage of the stamp by forming patterns based on the irradiation of and electron beam and light with respect to a metal-organic precursor composition and washing a developer. CONSTITUTION: A metal-organic precursor composition based on organic ligand is coated on a substrate for a stamp(S1). Electron beam and light are locally irradiated to the composition. A developer is washed to form a micro/nano hybrid patterned metal oxide thin film pattern(S2). The pattern is heated or undergoes microwave, X-ray, gamma-ray, or ultraviolet ray irradiation or plasma treatment in order to change one of the shape, the line width, and the height of the pattern(S3).</p> |
申请公布号 |
KR20120070076(A) |
申请公布日期 |
2012.06.29 |
申请号 |
KR20100131479 |
申请日期 |
2010.12.21 |
申请人 |
KOREA ADVANCED NANO FAB CENTER |
发明人 |
PARK, HYEONG HO;SHIN, YOUNG MIN;HWANG, SEON YONG;KIM, CHANG HWAN;KANG, HO KWAN;LEE, JEONG GUN;KO, CHUL GI |
分类号 |
G03F7/20;B82B3/00;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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