| 摘要 |
Liquid processing units 2 each for performing a liquid process on a substrate are arranged horizontally side by side, a gas exhaust pipe 3 for exhausting an atmosphere within the liquid processing units is provided under the liquid processing units 2 to be extended along an arrangement of the liquid processing units 2, and a flow control member group 402 is disposed under the gas exhaust pipe 3. Liquid supply main pipe 5 and liquid drain main pipe 6 are provided under the flow control member group 402 to be extended along the arrangement of the liquid processing units 2. Liquid supply branch pipes are branched from the liquid supply main pipe 5 and connected with the liquid processing unit 2 via the flow control member group 402, and liquid drain branch pipes are branched from the liquid drain main pipe 6 and connected with the liquid processing unit 2. |
