METHOD OF CORRECTING DEFECT OF GRAYTONE MASK, METHOD OF MANUFACTURING GRAYTONE MASK AND GRAYTONE MASK, AND PATTERN TRANSFER METHOD

摘要

The invention provides a gray level mask defection correcting method, that is a gray level mask defection correcting method for a semi-translucent section (23) having a shading section (21), a translucent section (22) and reducing translucent amount of exposal light to specified amount. The semi-translucent section (23) formed by semi-translucent film (26), and has a working procedure for determining the defection parts (51), (52) when generating defection in the semi-translucent section (23); a working procedure all semi-translucent film (26) of the semi-translucent section including the defections (51), (52), that is an area surrounded by at least on of the shading section and the translucent section; and a working procedure forming semi-translucent correcting film (27) different from raw material or composition of the semi-translucent film (26) at the semi-translucent film (26) removed area (53).