发明名称 Electrode configuration for LiMCA
摘要 <p>A method of making substantially continuous measurements in a Liquid Metal Cleanliness Analyzer (LiMCA), having a body of molten metal containing particles, electrically insulating wall means having a passage formed therein for passage of the molten metal, a 5 first electrode positioned on one side of the wall means and at least one additional electrode inserted in the molten metal on an opposite side of the wall means to the first electrode and voltage recording means connected between the first electrode and the at least one additional electrode, said method comprising: (a) drawing molten metal in one direction through said passage to immerse said first 10 electrode in molten metal; (b) supplying current at an initial predetermined level to the first electrode and to the at least one additional electrode to create a current loop between the at least one additional electrode and the first electrode, said current loop generating a wanted pulse signal that is recorded by the voltage recording means, and wherein said current is supplied from an 15 ultra-capacitor via at least one voltage control resistor associated with the at least one additional electrode; (c) monitoring the change in the current from said ultra-capacitor; (d) adjusting said at least one voltage control resistor associated with the at least one additional electrode to rapidly re-adjust the current output to said predetermined level 20 during the course of one measurement while said voltage recording means is temporarily prevented from recording the wanted pulse signal, thereby maintaining said supply of current at said predetermined level for a period of time required for said one measurement; and (e) expelling molten metal in an opposite direction through said passage while 25 recharging said ultra-capacitor.</p>
申请公布号 AU2010235916(B2) 申请公布日期 2012.06.28
申请号 AU20100235916 申请日期 2010.10.20
申请人 NOVELIS INC. 发明人 MARCOTTE, JACQUES;SLUSARENKO, YUHIL
分类号 G01D3/028;G01N27/00;G01N27/26 主分类号 G01D3/028
代理机构 代理人
主权项
地址
您可能感兴趣的专利