发明名称 |
SYSTEM AND METHOD FOR TREATING EXHAUST GAS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method for treating exhaust gas. <P>SOLUTION: In an exhaust gas treatment system 10, an oxide semiconductor arranged inside a gas duct 26 through which the exhaust gas 32 of a ship diesel engine 24 flows is heated to the state of an intrinsic range and contacted with the exhaust gas 32, and unburned material contained in the exhaust gas 32 is burned. An air supply means for shooting air 34 into the gas duct 26 is provided to a position upstream of the exhaust gas 32 than a position where the oxide semiconductor is arranged. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012122361(A) |
申请公布日期 |
2012.06.28 |
申请号 |
JP20100272093 |
申请日期 |
2010.12.07 |
申请人 |
HITACHI PLANT TECHNOLOGIES LTD |
发明人 |
MOCHIZUKI YOSHIHIKO;YUKI AKIO;HAYATSU MASAKI;ANDO HIROKI |
分类号 |
F01N3/02;B01D53/94;B01J21/06;F01N3/01;F01N3/05 |
主分类号 |
F01N3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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