发明名称 METHOD OF MANUFACTURING SOLAR CELL
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a solar cell having a crystalline well layer, and provided with a quantum well layer where the thickness of a well layer is controllable. <P>SOLUTION: A quantum well layer having an amorphous well layer consisting of a barrier layer 11 and an amorphous well layer is formed. Subsequently, the quantum well layer having an amorphous well layer is annealed so as to crystallize the amorphous well layer thus forming a quantum well layer 15 having a crystalline well layer. Both formation of a crystalline well layer 14 and retention of a laminate structure of the quantum well layer are obtained by setting the energy density imparted to the amorphous well layer by annealing in the range of 1.26 J/mm<SP POS="POST">2</SP>-28.8 J/mm<SP POS="POST">2</SP>. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012124392(A) 申请公布日期 2012.06.28
申请号 JP20100275244 申请日期 2010.12.10
申请人 HITACHI LTD 发明人 WATANABE KEIJI;MINE TOSHIYUKI;SHIMA AKIO;SEKIGUCHI TOMOKO;TSUCHIYA RYUTA
分类号 H01L31/04 主分类号 H01L31/04
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