发明名称 POLYCRYSTALLINE SILICON SOLAR CELL PANEL AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a cheap polycrystalline silicon solar cell panel by forming a polycrystalline silicon film on which a pn junction was formed in a small number of steps and in a short time. <P>SOLUTION: A manufacturing method of a polycrystalline silicon solar cell panel includes: a step of forming an amorphous silicon film on a substrate surface in sputtering using a target composed of a silicon doped into an n-type or p-type; a step of plasma-doping a surface layer of the amorphous silicon film in a p-type or n-type dopant; and a step of melting and recrystallizing the plasma-doped amorphous silicon film by scanning the plasma on the amorphous silicon film. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012124205(A) 申请公布日期 2012.06.28
申请号 JP20100271379 申请日期 2010.12.06
申请人 PANASONIC CORP 发明人 NAKAYAMA ICHIRO;YAMANISHI HITOSHI;OKUMURA TOMOHIRO
分类号 H01L31/04;H01L21/20 主分类号 H01L31/04
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