发明名称 METHOD FOR PRODUCING SEMICONDUCTOR GAS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing monofluoromethane which scarcely includes trifluoromethane from a trifluoromethane-containing monofluoromethane, wherein both cannot be efficiently separated from each other by distillation because the boiling points of them are close to each other, and which replaces distillation. <P>SOLUTION: The method for producing purified monofluoromethane includes a step to bring crude monofluoromethane containing at least trifluoromethane into contact with a trifluoromethane treatment liquid including an amide represented by general formula (1) and a base (in formula, R<SP POS="POST">1</SP>, R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>represent each independently a hydrogen atom or an alkyl group, or may be bonded to each other to form a ring wherein a ring carbon atom may be replaced by an oxygen atom, a nitrogen atom or a sulfur atom). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012121855(A) 申请公布日期 2012.06.28
申请号 JP20100274969 申请日期 2010.12.09
申请人 CENTRAL GLASS CO LTD 发明人 OKAMOTO MASAMUNE;TAKADA NAOKADO;IMURA HIDEAKI
分类号 C07C17/395;C07C19/08 主分类号 C07C17/395
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