| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus that is a plasma CVD apparatus in which generation of impurities during film deposition is suppressed. <P>SOLUTION: That surface of a resin frame being a seal member which is to be exposed to plasma is covered with a non-conductive ceramic member, thereby preventing plasma etching of a surface of the non-conductive fluororesin member. Thus, since generation of impurities during film deposition is suppressed, a high-efficiency thin-film solar cell can be obtained. Also, durability of the seal member is improved to achieve cost reduction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
