发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 The present invention includes a semiconductor substrate, a gate electrode which is provided on the semiconductor substrate, a source electrode and a drain elect rode which are provided on the semiconductor substrate to sandwich the gate electrode, and a recess provided below edges of the gate electrode at least on a drain electrode side.
申请公布号 US2012161146(A1) 申请公布日期 2012.06.28
申请号 US201113192780 申请日期 2011.07.28
申请人 SHIM JEOUNGCHILL;KABUSHIKI KAISHA TOSHIBA 发明人 SHIM JEOUNGCHILL
分类号 H01L29/78;H01L21/336;H01L29/20 主分类号 H01L29/78
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