METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK

摘要

PURPOSE: A method for manufacturing a reflective mask and an apparatus for manufacturing the reflective mask are provided to etch a reflective layer on a substrate by using gas containing chlorine and oxygen. CONSTITUTION: A reflective layer(202) is formed on the main surface of a substrate(201). An absorbent layer(204) is formed on the reflective layer. Pattern regions are formed on the absorbent layer. A light shielding region is formed to surround the pattern region of the absorbent layer and the reflective layer. The reflective layer is etched using gas containing chlorine and oxygen. The content of oxygen in the gas is between 5 vol% and 30 vol%, inclusively. The reflective layer includes a molybdenum-containing layer and a silicon-containing layer.