发明名称 LASER DICING DEVICE AND METHOD, CLEAVING DEVICE AND METHOD, AND WAFER PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide laser dicing device and method which allow processing without touching the front surface of a wafer, and to provide cleaving device and method, and a wafer processing method. <P>SOLUTION: A wafer W is mounted on a dicing frame F with a transparent dicing tape T adhered to the rear surface thereof. The wafer W mounted on a dicing frame F is held on a transparent wafer table 20 by being sucked at the rear surface thereof. Laser light passes through the transparent wafer table 20 and the transparent dicing tape T before impinging on the rear surface of the wafer W. The wafer W is thereby held without touching the front surface thereof, and the laser light can impinge on the rear surface of the wafer W. Consequently, laser dicing can be carried out without destroying the elements, and the like, formed on the front surface of the wafer W. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012124468(A) 申请公布日期 2012.06.28
申请号 JP20110230714 申请日期 2011.10.20
申请人 TOKYO SEIMITSU CO LTD 发明人 SHIMIZU TAKASUKE;FUJITA TAKASHI
分类号 H01L21/301;B23K26/10;B23K26/14;B23K26/38;B23K26/40;H01L21/683 主分类号 H01L21/301
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