发明名称 FERROMAGNETIC SPUTTERING TARGET
摘要 <p>Provided is a sputtering target comprising a metal having the composition of 20 mol% or less of Cr, 5 mol% or more of Pt, and Co as the remainder. This target is a ferromagnetic sputtering target characterized in having a metal base (A) and having, in (A), a Co-Ru alloy phase (B) that includes at least 30 mol% of Ru, and a metal or alloy phase (C) that is different from phase (B) and comprises Co or mainly comprises Co. The obtained ferromagnetic sputtering target lessens magnetic flux leakage and is capable of discharging stably in magnetron sputtering equipment.</p>
申请公布号 WO2012086575(A1) 申请公布日期 2012.06.28
申请号 WO2011JP79321 申请日期 2011.12.19
申请人 JX NIPPON MINING & METALS CORPORATION;ARAKAWA ATSUTOSHI;IKEDA YUKI 发明人 ARAKAWA ATSUTOSHI;IKEDA YUKI
分类号 C23C14/34;C23C14/06;C23C14/14;G11B5/851;H01F10/16;H01F41/18 主分类号 C23C14/34
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