EXPOSURE DEVICE, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR DISPLAY PANEL SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To improve, when a pattern is drawn on a substrate by scanning the substrate with plural light beams from plural light beam irradiation devices, the drawing quality by correcting variation in intensity distribution of diffraction light of the light beams due to variation in operation angle of a mirror of a spatial optical modulator.

SOLUTION: A correction mirror 53 is provided in the optical path of the light beam before an irradiation optical system 20b of each light beam irradiation device 20. Each light beam irradiation device 20 is provided with adjusting means for adjusting an angle of the correction mirror 53. The angle of the correction mirror 53 of each light beam irradiation device 20 is adjusted by the adjusting means of each light beam irradiation device 20 in accordance with the variation in operation angle of a mirror 25a of the spatial optical modulator of each light beam irradiation device 20. Thus, the optical path of the light beam entering the irradiation optical system 20b of each light beam irradiation device 20 is corrected.

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