| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam lens capable of reducing aberration by reducing deformation due to electrostatic attracting force of an electrode using a thin film having residual stress. <P>SOLUTION: The charged particle beam lens controls optical characteristics of charged particle beams radiated from a charged particle source. A plurality of counter electrodes 2A, 2B, 2C are provided via an air gap in an optical axis direction. The counter electrodes 2A, 2B, 2C have not only at least each one of apertures 3A, 3B, 3C for passage of the charged particle beams to penetrate through the counter electrodes in the optical axis direction but also a thin film 4 on at least one surface. The thin film 4 is formed so as to have the residual stress for reducing the deformation of the counter electrodes generated by applying the voltage for controlling the optical characteristics to the counter electrodes. <P>COPYRIGHT: (C)2012,JPO&INPIT |
