发明名称 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TEMPLATE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To form a multiplicity of shot patterns on a substrate while preventing defective pattern forming. <P>SOLUTION: In a pattern forming method, as a preprocess to form a circuit pattern on the substrate by imprinting, a wall pattern to intercept between imprint shots is formed by surrounding the periphery of a region to have an imprint shot on the substrate at a prescribed height, for each imprint shot. An imprint material is then dripped into the imprint shot surrounded by the wall pattern. Then, by pressing a template onto the imprint material, the circuit pattern is formed in the imprint shot surrounded by the wall pattern. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012124394(A) 申请公布日期 2012.06.28
申请号 JP20100275279 申请日期 2010.12.10
申请人 TOSHIBA CORP 发明人 KOJIMA TOMOKO
分类号 H01L21/027;B29C59/02;B81C3/00 主分类号 H01L21/027
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