CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICES USING SAME

摘要

Provided are a chemical vapor deposition apparatus and a method for manufacturing light-emitting devices using the same. The chemical vapor deposition apparatus according to an embodiment of the present invention comprises: a chamber body including a susceptor having at least one pocket in which a wafer is loaded; a chamber cover which is arranged on the chamber body to open/close the chamber body, and which forms a reaction space between the susceptor and the chamber cover; a reaction gas supply unit which supplies reaction gas to the reaction space such that the reaction gas flows on the susceptor; and a non-reacting gas supply unit which supplies non-reacting gas to the reaction space such that the non-reacting gas flows along a surface of the chamber cover in the reaction space between the susceptor and the chamber cover and thus the reaction gas is prevented from contacting the surface of the chamber cover.