发明名称 |
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing device which suppresses the occurence of defective devices. <P>SOLUTION: A substrate processing device includes: a first transfer mechanism transferring a belt-like substrate from a first supply part to a first recovery part; a first device attaching a cover member to at least a part of a rear surface of the substrate transferred from the first supply part; a surface treatment device performing treatment on a surface of the substrate transferred from the first device with the cover member attached to the rear surface; and a second device which is disposed between the surface treatment device and the first recovery part and removes the cover member from the substrate transferred from the surface treatment device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012124435(A) |
申请公布日期 |
2012.06.28 |
申请号 |
JP20100276197 |
申请日期 |
2010.12.10 |
申请人 |
NIKON CORP |
发明人 |
SUGIZAKI TAKASHI;KOIZUMI SHOHEI;MIYAMOTO KENJI |
分类号 |
H01L21/683;B08B3/04;H01L21/027 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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