发明名称 SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing device which suppresses the occurence of defective devices. <P>SOLUTION: A substrate processing device includes: a first transfer mechanism transferring a belt-like substrate from a first supply part to a first recovery part; a first device attaching a cover member to at least a part of a rear surface of the substrate transferred from the first supply part; a surface treatment device performing treatment on a surface of the substrate transferred from the first device with the cover member attached to the rear surface; and a second device which is disposed between the surface treatment device and the first recovery part and removes the cover member from the substrate transferred from the surface treatment device. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012124435(A) 申请公布日期 2012.06.28
申请号 JP20100276197 申请日期 2010.12.10
申请人 NIKON CORP 发明人 SUGIZAKI TAKASHI;KOIZUMI SHOHEI;MIYAMOTO KENJI
分类号 H01L21/683;B08B3/04;H01L21/027 主分类号 H01L21/683
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