发明名称 MANUFACTURING METHOD FOR WAVELENGTH VARIABLE INTERFERENCE FILTER, WAVELENGTH VARIABLE INTERFERENCE FILTER, OPTICAL MODULE, AND OPTICAL ANALYSIS DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a wavelength variable interference filter with reduced bending of a substrate, a wavelength variable interference filter, an optical module, and an optical analysis device. <P>SOLUTION: A manufacturing method for a wavelength variable interference filter 1 including a fixed substrate 11, a movable substrate 12 having a movable part 121 and a holding part 122, a fixed reflection film 16, a movable reflection film 17, and an electrostatic actuator 14 for varying a gap G between the fixed reflection film 16 and the movable reflection film 17 comprises: a fixed substrate manufacturing step for manufacturing the fixed substrate 11 with higher rigidity than the movable substrate 12, with a material having a first thermal expansion coefficient; a movable substrate manufacturing step for manufacturing the movable substrate 12 with a material having a second thermal expansion coefficient that is higher than the first thermal expansion coefficient; and a bonding step for bonding the fixed substrate 11 and the movable substrate 12 to each other in a state that they are heated up to a first temperature. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012123187(A) 申请公布日期 2012.06.28
申请号 JP20100273790 申请日期 2010.12.08
申请人 SEIKO EPSON CORP 发明人 ARAKAWA KATSUHARU
分类号 G02B26/00;B81B3/00;B81C3/00;G02B5/28 主分类号 G02B26/00
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