| 摘要 |
PURPOSE: A patterned retarder plate and a manufacturing method thereof are provided to implement photo-alignment using a mask through a single process. CONSTITUTION: A polarizing plate(400) having a fixed transmission axis(410) is formed on the top of a photo-alignment layer(200). A patterned retarding mask(300), in which optical axes with aλ/2 retarding pattern are alternately formed at the interval of 45 degrees, is located under the polarizing plate. The optical axes(311,312) of the patterned retarding mask are controlled to 22.5 or -22.5 degrees to the transmission axis of the polarizing plate. The patterned retarding mask is formed with optical axes(211,212) alternately oriented to 45 and -45 degrees to the transmission axis of the polarizing plate so that polarized light passing through the patterned retarding mask has 45 or -45 degrees to incident polarized light. |
