POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE: A positive type photo-sensitive resin composition is provided to improve patter shapes by including polybenzoxazole precursors, photo-sensitive diazoquinone compounds, silane compounds, phenol compounds, and a solvent. CONSTITUTION: A positive type photo-sensitive resin composition includes polybenzoxazole precursors, photo-sensitive diazoquinone compounds, silane compounds, phenol compounds, and a solvent. The polybenzoxazole precursors include repeating units represented by chemical formula 1. In chemical formula 1, X1 and X2 are respectively aromatic organic groups or tetravalent to hexavalent aliphatic organic groups; Y1 is an aromatic organic group or a divalent to hexavalent organic group; R1 and R2 are respectively C1 to C6 alkylene groups; and R3 is a C1 to C6 alkyl group.