DEVICE FOR MEASURING AND METHOD FOR CORRECTING SAME

摘要

The present invention relates to a device for measuring a substrate on which an object to be measured is formed, and to a method for correcting same. The method for correcting, according to the present invention, comprises: measuring the phase of the substrate for measuring a reference phase, by means of a state imaging portion, and measuring the reference phase; acquiring a tilted position of the reference plane of the measured reference phase in relation to the image plane of the state imaging portion; and calculating from the tilted position the height to which the reference plane should be corrected in relation to the state imaging portion. Correcting the reference plane, which is the reference for measuring the height, based on a tilted position of the reference phase, can enhance the reliability of the measurement of the object to be measured.