发明名称 METHOD OF MANUFACTURING THIN FILM TRANSISTOR AND THIN FILM TRANSISTOR SUBSTRATE
摘要 A thin film transistor substrate. The thin film transistor substrate includes a substrate, an adhesive layer on the substrate, and a semiconductor layer having a first doped region, a second doped region and a channel region on the adhesive layer. The thin film transistor substrate further includes a first dielectric layer on the semiconductor layer, a gate electrode overlapping the channel region, a second dielectric layer on the first dielectric layer and the gate electrode, a source electrode disposed on the second insulating layer, and a drain electrode spaced apart from the source electrode on the source electrode. The channel region is disposed between the first doped region and the second doped region, and has a transmittance higher than those of the first doped region and the second doped region.
申请公布号 US2012161234(A1) 申请公布日期 2012.06.28
申请号 US201213350037 申请日期 2012.01.13
申请人 KOO JAE BON;YOU IN-KYU;AHN SEONGDEOK;CHO KYOUNG IK;ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KOO JAE BON;YOU IN-KYU;AHN SEONGDEOK;CHO KYOUNG IK
分类号 H01L29/772 主分类号 H01L29/772
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