| 摘要 |
PURPOSE: A lithographic apparatus is provided to supply a fluid supply system which supplies fluid at high flowing speed while keeping laminar flow. CONSTITUTION: An immersion lithographic apparatus includes a fluid handling system for supplying fluid. The fluid handling system includes a chamber(26) with inflow holes(29) in the first side wall(28) and outflow holes in the second side wall(22). The first side wall faces the second side wall. The inflow holes are toward a direction in which fluid inflowing into the chamber are toward areas of the second side wall. |
