发明名称 PHOTOCURABLE DRIP-PROOFING MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a photocurable drip-proofing material used for forming a coating film to cover flux residues of a soldering part, which is a drip-proofing material suitable for controlling cracks in the flux residues while ensuring photo-curability. <P>SOLUTION: The photocurable drip-proofing material used for forming a coating film to cover flux residues of a soldering part comprises each component of: (A) hydrogenated polybutadiene acrylate; (B) polyisocyanate having three or more isocyanate groups in one molecule; (C) a reaction solvent; and (D) a photopolymerization initiator. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012121935(A) 申请公布日期 2012.06.28
申请号 JP20100271290 申请日期 2010.12.06
申请人 DENSO CORP 发明人 OKITA HIKARI
分类号 C09D4/02;C09D5/00;C09D7/12;C09D109/00 主分类号 C09D4/02
代理机构 代理人
主权项
地址