POSITIONING APPARATUS

摘要

A positioning apparatus includes a base plate and a deflection mechanism mounted upon the base plate. The deflection mechanism includes a stationary platform, a rocker assembly and a deflection platform. The stationary platform is mounted over the base plate for placing and positioning a workpiece. The deflection platform is tiltably mounted over the stationary platform via the rocker assembly and the height of the stationary platform itself is adjustable. The rocker assembly comprises a first rocker and a second rocker of different lengths.