发明名称 INORGANIC MEDIUM FOR BARREL POLISHING
摘要 <p>Provided is an inorganic medium for barrel polishing, said inorganic medium enabling coarse finishing while exhibiting superior abrasion resistance. The inorganic medium for barrel polishing has a significant effect on costs and environmental impact because the sludge generated during barrel polishing is treated as industrial waste, as well as enabling coarse finishing and exhibiting superior abrasion resistance. In order to obtain the inorganic medium, a mixed material of argillaceous particulates and polishing particles is sintered. The inorganic medium contains at least 60-80wt% aluminium oxide, 10-30wt% silicon dioxide, 4-8wt% zirconium oxide, and 1-3wt% calcium oxide.</p>
申请公布号 WO2012086679(A1) 申请公布日期 2012.06.28
申请号 WO2011JP79621 申请日期 2011.12.21
申请人 SINTOKOGIO, LTD.;NAITO TAKASHI;ITO TAKUYA 发明人 NAITO TAKASHI;ITO TAKUYA
分类号 B24B31/14;C09K3/14 主分类号 B24B31/14
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