VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE, AND ORGANIC EL DISPLAY DEVICE

摘要

In the present invention, while relatively moving a substrate (10) with respect to a vapor deposition mask (70) in the state of being separated by a set spacing, vapor deposition particles (91) released from the vapor deposition source aperture (61) of a vapor deposition source (60) are caused to pass in the given order through a space (82) between a plurality of restriction plates (81) that a restriction plate unit (80) has and a mask opening (71) of the vapor deposition mask, and then are caused to adhere to the substrate, forming a coating film (90). It is determined whether or not it is necessary to correct the position in the X-axis direction of at least one of the plurality of restriction plates, and if correction is necessary, the position in the X-axis direction of the at least one of the plurality of restriction plates is corrected. As a result, it is possible to stably form at a desired position on the surface of a large substrate a coating film of which edge blurring has been suppressed.