发明名称 EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To obliquely emit exposure light to an oriented film without enlarging a region where the exposure light passes through, and to improve a through-put by shortening a tact time when forming a plurality of different alignment regions on the oriented film on one substrate. <P>SOLUTION: Polarizing optical element 2b and 2c, polarizing optical elements 2d and 2e, polarizing optical elements 2f, 2g, 2h, and 2i or polarizing optical elements 2j and 2k that allow exposure light emitted from an exposure light irradiation device 30 transmit therethrough to incline the advancing direction of the exposure light are provided on the upper face or the lower face of a mask 2 to emit the exposure light obliquely from the mask 2 to a substrate 1. The various types of the polarizing optical element 2b and 2c, the polarizing optical elements 2d and 2e, the polarizing optical elements 2f, 2g, 2h, and 2i or the polarizing optical elements 2j and 2k incline the advancing direction of the exposure light emitted from the exposure light irradiation device 30 to different directions respectively. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012123206(A) 申请公布日期 2012.06.28
申请号 JP20100274032 申请日期 2010.12.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NEMOTO RYOJI
分类号 G02F1/1337;G02F1/13 主分类号 G02F1/1337
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