METHOD FOR INSPECTING SUBSTRATE

摘要

The present invention relates to a method for inspecting a substrate on which an object to be measured is formed, and according to the present invention, comprises the following steps: measuring the substrate on which the object to be measured is formed to create a plane equation for the substrate; finding the area of the object to be measured, which is formed on the substrate; converting the area of the object to be measured into a substrate plane using the plane equation, taking into consideration the height of the object to be measured; and inspecting the object to be measured based on the area of the object to be measured, which is converted into the substrate plane using the plane equation, and the area of the object to be measured according to reference data. As a result, finding the offset value of the object to be measured, from a tilted position of the substrate on which the object to be measured is formed, and using same to compensate for the distortion of measurement data, can enhance the reliability of the measurement of the object to be measured.