| 发明名称 |
Sputter Deposition and Annealing of High Conductivity Transparent Oxides |
| 摘要 |
Sputtering deposition processes for generation of transparent conductive metal oxide films, and films produced by such methods, are disclosed.
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| 申请公布号 |
US2012160663(A1) |
申请公布日期 |
2012.06.28 |
| 申请号 |
US201113324835 |
申请日期 |
2011.12.13 |
| 申请人 |
GILLASPIE DANE;GENNETT THOMAS;GINLEY DAVID S.;PERKINS JOHN;ALLIANCE FOR SUSTAINABLE ENERGY, LLC. |
发明人 |
GILLASPIE DANE;GENNETT THOMAS;GINLEY DAVID S.;PERKINS JOHN |
| 分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
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