APPARATUS AND METHOD FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A chemical vapor depositing device and a chemical vapor depositing method are provided to form uniform heat distribution in a susceptor by controlling a frequency of a high frequency source applied to a plurality of high frequency coils. CONSTITUTION: Processing gas is provided to the inside of a chamber(110). A susceptor(130) is arranged in the chamber. The susceptor supports the substrate. A high frequency coil(210) is divided into plural parts and corresponds to the whole area of the susceptor. The high frequency coil heats the susceptor by receiving an additional high frequency source.