| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to improve thermal transfer efficiency by using an inductive heating type heater. CONSTITUTION: A shower head(121) sprays processing gas to a processing space. A susceptor(131) is installed in the lower side of the processing space to face the shower head. An inductive heater(160) inductively heats the susceptor. A liner(140) is closely adhered to the inner side of the chamber and the side of the susceptor. A discharge unit(150) is installed outside the liner.
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