发明名称 Composition and manufacturing method
摘要 A device includes a substrate (308) and a metallic layer (336) formed over the substrate (308) with a deposition process for which the metallic layer (336) is characterizable as having a pre-determinable as-deposited defect density. As a result of a fabrication process, the defect density of the metallic layer (336) is reduced relative to the pre-determinable as-deposited defect density of the same layer (336) or another layer having like composition and which is formed under like deposition conditions. In a related method, a substrate (308) is provided and a removable layer (330) is formed over the substrate (308). A metallic layer (336) is formed over the removable layer (330) and is patterned and etched to define a structure over the removable layer (330). The removable layer (330) is removed, and the metallic layer (336) is heated for a time beyond that necessary for bonding of a hermetic sealing cap (340) thereover.
申请公布号 EP2468928(A2) 申请公布日期 2012.06.27
申请号 EP20110193469 申请日期 2011.12.14
申请人 GENERAL ELECTRIC COMPANY 发明人 DETOR, ANDREW JOSEPH;CORDERMAN, REED;KEIMEL, CHRISTOPHER;AIMI, MARCO
分类号 C25D3/56;C25D1/00;C25D5/02;C25D5/48;C25D5/50;C25D7/00;C25D7/12;H01H1/00;H01H59/00;H05K13/04 主分类号 C25D3/56
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