| 摘要 |
PURPOSE: A plasma processing apparatus of an inductively coupled type is provided to form a closed loop of an eddy current by forming a plurality of cutting units. CONSTITUTION: A plasma processing apparatus of an inductively coupled type includes a chamber, a susceptor located inside the chamber, and a lead located on the top of the chamber. The lead comprises a lead frame(210) formed into a grid format, a ceramic window(220) installed on the top of the lead frame, and an antenna installed on the top of the window. The lead frame includes an outer frame(211) and an engaging frame(212) extended between outer frames. An RF power supply unit supplies a high frequency of 13.56Mhz to an antenna. A processing gas supply unit supplying a process gas is formed on the lead frame. |
