发明名称 |
MICROPATTERNING OF CONDUCTING POLYMER USING PLASMA PROCESS, INKJET PRINTING, AND VAPOR DEPOSITION POLYMERIZATION |
摘要 |
PURPOSE: A method for forming a micro pattern of a conductive polymer using a plasma process, an inkjet printing, and a vapor deposition polymerization is provided to form a pattern with high quality by reforming the surface of a supporter through the plasma process. CONSTITUTION: A surface of a supporter is reformed by processing a flexible supporter with plasma. Polymerization initiator solutions for an inkjet printing are made by dissolving polymerization initiator in water. The polymerization initiator solutions are injected into a printer head and a desirable size and a desirable shape are printed on the supporter with the reformed surface with an inkjet printer using a computer program. The supporter printed with the polymerization initiator solutions is located in a vapor deposition polymerization reactor. A conductive polymer pattern is formed by vaporizing chemical materials in reaction to a monomer of a conductive polymer.
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申请公布号 |
KR20120068617(A) |
申请公布日期 |
2012.06.27 |
申请号 |
KR20100130313 |
申请日期 |
2010.12.17 |
申请人 |
SNU R& DB FOUNDATION |
发明人 |
JANG, JYONG SIK;JANG, YONG JIN;CHO, JOON HYUK;SHIN, KYOUNG HWAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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