Improved method for manufacturing a photovoltaic device comprising a TCO layer

摘要

The present invention is directed to a method for fabricating a photovoltaic device, comprising depositing a transparent conductive oxide (TCO) layer on a substrate, exposing the TCO layer to laser irradiation using a set of irradiation parameters, and exposing the laser irradiated TCO layer to an etching process using a set of etching parameters, characterized in that the irradiation parameters and the etching parameters are selected such that the haze% of the TCO layer increases compared to the as deposited TCO layer.
Additionally, the present invention is directed to a TCO layer having a haze% of at least 20% for an incident light wavelength contained in the range between 350 and 1300 nm.
Further the present invention is directed to a photovoltaic device comprising such TCO-layer.