POSITIVE PHOTORESIST COMPOSITION AND PATTERNING METHOD OF PHOTORESIST USING THE SAME

摘要

PURPOSE: A positive photo-resist composition and a method for forming photo-resist patterns using the same are provided to prevent the reduction of yield due to coating stains and pattern exfoliation. CONSTITUTION: A positive photo-resist composition includes 10 to 25 weight% of an alkali soluble resin, 1 to 10 weight% of a photo-sensitive compound, 1 to 10 weight% of a cyclic terpene compound, and remaining amount of solvents based on the total weight of the composition. The cyclic terpene compound is limonene or terpinene. The alkali soluble resin is a novolac resin. The photo-sensitive compound is a diazide-based compound. The solvents is one or more selected from a group including 3-methoxylbuthyl acetate, methyl methoxy propionate, butyl acetate, ethyl lactate, gamma butyrolactone, propylene glycol monomethyl ether acetate.