METHOD FOR PREPARING MULTI-COMPONENT THIN FILM

摘要

PURPOSE: A method for forming a multi-component thin film is provided to improve a dielectric property by easily controlling compositions in a thin film. CONSTITUTION: A first precursor is absorbed on a substrate in a chamber. A non-reactive first precursor is removed by a purge. The substrate with the first precursor is processed with plasma. A second precursor is absorbed on the substrate. A non-reactive second precursor is removed by the purge. The absorbed first precursor and second precursor are reacted with reaction gas by supplying the reaction gas to the chamber. The non-reactive gas and reaction byproducts are removed by the purge.