发明名称 Alignment mark and a method of aligning a substrate comprising such an alignment mark
摘要 An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle &alpha; with respect to the scribe lane direction: 0°<&alpha;<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle &bgr; with respect to the scribe lane direction: &minus;90°&nlE;&bgr;<0°.
申请公布号 US8208121(B2) 申请公布日期 2012.06.26
申请号 US20090363320 申请日期 2009.01.30
申请人 BIJNEN FRANCISCUS GODEFRIDUS CASPER;TENNER MANFRED GAWEIN;WARNAAR PATRICK;VAN KEMENADE MARC;ASML NETHERLANDS B.V. 发明人 BIJNEN FRANCISCUS GODEFRIDUS CASPER;TENNER MANFRED GAWEIN;WARNAAR PATRICK;VAN KEMENADE MARC
分类号 G03B27/42;G03B27/58 主分类号 G03B27/42
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