发明名称 Method of fabricating an inductor structure
摘要 A damascene process is utilized to fabricate the segmented magnetic core elements of an integrated circuit inductor structure. The magnetic core is electroplated from a seed layer that is conformal with a permanent dielectric mold that results in sidewall plating defining an easy magnetic axis. The hard axis runs parallel to the longitudinal axis of the core and the inductor coils are orthogonal to the core's longitudinal axis. The magnetic field generated by the inductor coils is, therefore, parallel and self-aligned to the hard magnetic axis. The easy axis is enhanced by electroplating in an applied magnetic field parallel to the easy axis.
申请公布号 US8205324(B2) 申请公布日期 2012.06.26
申请号 US20080275599 申请日期 2008.11.21
申请人 SMEYS PETER;JOHNSON PETER;PAPOU ANDREI;NATIONAL SEMICONDUCTOR CORPORATION 发明人 SMEYS PETER;JOHNSON PETER;PAPOU ANDREI
分类号 H01F3/00;H01F41/02 主分类号 H01F3/00
代理机构 代理人
主权项
地址