SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM FOR PERFORMING THE SAME

摘要

PURPOSE: A substrate processing method and a substrate processing system for executing the same are provided to easily confirm the progress and end-point of a super-critical fluid process by analyzing concentration of target material within a discharged fluid in real time. CONSTITUTION: A substrate is loaded within a processing chamber(S110). A super-critical fluid process is executed by providing a supercritical fluid to the substrate. The super-critical fluid is discharged from the processing chamber during the super-critical fluid process(S120). A real-time concentration value of a target material included within the discharged super-critical fluid is measured(S140). An end-point of the super-critical fluid process is determined according to the real-time concentration value of the target material(S140).