发明名称 |
Alignment system and alignment marks for use therewith |
摘要 |
A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal. |
申请公布号 |
US8208140(B2) |
申请公布日期 |
2012.06.26 |
申请号 |
US20100718485 |
申请日期 |
2010.03.05 |
申请人 |
HULSEBOS EDO MARIA;BIJNEN FRANCISCUS GODEFRIDUS CASPER;WARNAAR PATRICK;ASML NETHERLANDS B.V. |
发明人 |
HULSEBOS EDO MARIA;BIJNEN FRANCISCUS GODEFRIDUS CASPER;WARNAAR PATRICK |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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