发明名称 APPARATUS FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL
摘要 <p>PURPOSE: A silicon carbide single crystal manufacturing device is provided to make a SiC single crystal grow up for a long time by reducing deposition of the SiC poly-crystal at a portion which does not want. CONSTITUTION: A first purge gas inflow port(8b) is included at the inner wall of a heating container. A purge gas supply source(14) supplies purge gas to the first purge gas inflow port. A second purge gas inflow port is included at the external wall of a base. The base is located within a reacting chamber of the heating container. The base comprises a first side and a second side. The second side is an opposite side of the first side. A purge gas inflow tool(11) supports the base. The purge gas inflow tool supplies the purge gas to the base from the second side of the base.</p>
申请公布号 KR20120067944(A) 申请公布日期 2012.06.26
申请号 KR20110134714 申请日期 2011.12.14
申请人 DENSO CORP. 发明人 TOKUDA YUUICHIROU;HARA KAZUKUNI;KOJIMA JUN
分类号 C30B23/02;C30B29/36;H01L21/20 主分类号 C30B23/02
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