发明名称 |
APPARATUS FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
<p>PURPOSE: A silicon carbide single crystal manufacturing device is provided to make a SiC single crystal grow up for a long time by reducing deposition of the SiC poly-crystal at a portion which does not want. CONSTITUTION: A first purge gas inflow port(8b) is included at the inner wall of a heating container. A purge gas supply source(14) supplies purge gas to the first purge gas inflow port. A second purge gas inflow port is included at the external wall of a base. The base is located within a reacting chamber of the heating container. The base comprises a first side and a second side. The second side is an opposite side of the first side. A purge gas inflow tool(11) supports the base. The purge gas inflow tool supplies the purge gas to the base from the second side of the base.</p> |
申请公布号 |
KR20120067944(A) |
申请公布日期 |
2012.06.26 |
申请号 |
KR20110134714 |
申请日期 |
2011.12.14 |
申请人 |
DENSO CORP. |
发明人 |
TOKUDA YUUICHIROU;HARA KAZUKUNI;KOJIMA JUN |
分类号 |
C30B23/02;C30B29/36;H01L21/20 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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