| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
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| 申请公布号 |
US8208120(B2) |
申请公布日期 |
2012.06.26 |
| 申请号 |
US20080078997 |
申请日期 |
2008.04.09 |
| 申请人 |
LOF JOERI;DERKSEN ANTONIUS THEODORUS ANNA MARIA;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MODDERMAN THEODORUS MARINUS;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR;DONDERS SJOERD NICOLAAS LAMBERTUS;ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;DERKSEN ANTONIUS THEODORUS ANNA MARIA;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MODDERMAN THEODORUS MARINUS;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR;DONDERS SJOERD NICOLAAS LAMBERTUS |
| 分类号 |
G03B27/42;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G03B27/42 |
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